Sleep Technology (RPSGT) · EEG and PSG Instrumentation
The International 10-20 System and Sleep Montage Landmarks
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In 30 seconds
The International 10-20 system Proportional scalp-electrode placement standard Full entry → is a standardized method for describing scalp locations using proportional (10% and 20%) distances between four landmarks: the Nasion Bridge-of-nose indentation Full entry →, the Inion Back-of-skull prominence Full entry →, and the left and right Preauricular points Depressions in front of each ear Full entry →. It ensures electrodes sit at comparable positions on heads of different sizes, so recordings can be reproduced and compared across patients and labs. The Modified 10-20 sleep montage Reduced electrode set for staging Full entry → uses a reduced set — typically frontal (F3, F4 Left/right frontal electrodes Full entry →), central (C3, C4 Left/right central electrodes Full entry →), occipital (O1, O2 Left/right occipital electrodes Full entry →), and mastoid references (M1, M2 Left/right mastoid references Full entry →) — recorded in referential derivations. Precise, documented placement is essential for accurate staging and scoring.
Why this matters
Accurate, reproducible placement is a data-quality and safety issue: misplaced electrodes can mimic or hide the very EEG features used to stage sleep and recognize events. Technologists therefore follow institutional protocol, accreditation standards, and manufacturer IFU, and document the montage, references, and deviations. Because montages vary by institution, a technologist must know their lab's montage and recognize legacy terminology (A1/A2 vs. M1/M2). Placement is performed respectfully and within scope; the technologist records signals, and the physician interprets findings.
The college version
1. Landmarks and cranial measurements
The system is anchored by four landmarks: the nasion (indentation at the bridge of the nose), the inion (bony prominence at the back of the skull), and the left and right preauricular points (the depressions just in front of each ear's tragus). Cranial measurements Anterior-posterior, transverse, circumferential distances Full entry → are taken along defined paths: anterior-posterior (nasion to inion over the vertex), transverse (preauricular point to preauricular point through the vertex), and circumferential (around the head). These define the grid on which Proportional placement Sites at 10%/20% fractions of distances Full entry → is based.
2. Proportional placement and electrode labeling
Proportional placement locates sites at 10% and 20% intervals of the measured distances rather than fixed physical distances. This is the standardized-placement rationale: it makes placement reproducible across head sizes, technologists, and laboratories, allowing valid comparison over time and across labs, and it aligns sites with known brain regions. Electrode labeling Region letter + side number/letter Full entry → follows a code: the letter indicates the region (F = frontal, C = central, O = occipital, T = temporal, P = parietal), and the number or letter indicates side — odd for left, even for right, "z" for midline. Thus F3/F4 are left/right frontal, C3/C4 left/right central, and O1/O2 left/right occipital.
3. The modified 10-20 sleep montage and derivations
The modified 10-20 sleep montage is a reduced electrode set sufficient for staging and event recognition, commonly F3, F4, C3, C4, O1, O2, and the references M1 and M2 (left and right mastoid). A1/A2 terminology context: older systems called these ear references A1 (left) and A2 (right); current AASM terminology uses M1/M2, but technologists should recognize both in legacy literature and equipment. A referential montage records each electrode against a common reference (e.g., F4 against contralateral M1), preserving local amplitude; a bipolar montage records the difference between two active electrodes, helping localize activity. Sleep staging relies primarily on referential derivations per current guidance, but the exact montage can vary by institution.
How it works
- The four landmarks anchor the measurement grid.
- Cranial measurements (anterior-posterior, transverse, circumferential) define the distances.
- Sites are located proportionally at 10%/20% intervals, fitting any head size.
- Labels encode region (letter) and side (odd left, even right, "z" midline).
- The modified 10-20 montage selects the staging sites (F3/F4, C3/C4, O1/O2, M1/M2).
- Derivation (referential vs. bipolar) determines how each channel is displayed, and placement is documented.
Common confusions
| Do not confuse | With | Difference |
|---|---|---|
| Nasion | Inion | Front (nose bridge) vs. back (skull bump) |
| Preauricular point | Inion | Ear-front point vs. occipital bump |
| Referential montage | Bipolar montage | Common reference vs. two active electrodes |
| M1/M2 | A1/A2 | Current vs. older reference labels |
| F3/F4 | O1/O2 | Frontal vs. occipital sites |
| Transverse | Circumferential | Ear-to-ear vs. around-the-head path |
Memory aids
Landmarks: "N-I-P-P" — Nasion, Inion, Preauricular (left/right). Sleep-montage electrodes: "F-C-O-M" — Frontal, Central, Occipital, Mastoid. Labeling: "odd left, even right, z is midline."
Quick review
Topic Recap
- The 10-20 system locates electrodes by proportional 10%/20% intervals.
- Four landmarks anchor it: nasion, inion, left/right preauricular points.
- Cranial measurements are anterior-posterior, transverse, and circumferential.
- The modified sleep montage commonly uses F3, F4, C3, C4, O1, O2, M1, M2.
- Referential vs. bipolar derivations change how voltage is displayed.
- Documentation and awareness of institutional montage variation are essential.
Knowledge Check
- What are the four landmarks anchoring the 10-20 system?
- Why is placement proportional rather than based on fixed distances?
- Which electrodes typically make up the modified 10-20 sleep montage?
- How does a referential montage differ from a bipolar montage?
- What do M1 and M2 stand for, and how do they relate to A1/A2?
Answers and Rationales
- Nasion, inion, and the left/right preauricular points. Why: They are the fixed anchors for all measurements.
- So sites fall at the same relative brain locations on any head size, keeping recordings comparable. Why: Fixed distances would shift positions on different-sized heads.
- Typically F3, F4, C3, C4, O1, O2, and mastoid references M1, M2. Why: This reduced set is sufficient for staging.
- Referential records each electrode against a common reference; bipolar records the difference between two active electrodes. Why: Referential preserves local amplitude; bipolar localizes activity.
- M1/M2 are the current left/right mastoid references; A1/A2 are the older ear-reference labels for the same role. Why: Recognizing both avoids legacy/current confusion.

Eli explains
The same idea, in plain words
Explain it like I’m 10
Imagine dividing a map of the head into a grid using a flexible tape, so every "address" (electrode position) is a fixed fraction of the distance between four landmarks — the bridge of the nose, the bump at the back of the skull, and the two points just in front of each ear. Because positions are fractions (10% or 20%) rather than fixed inches, the same address means the same brain region whether the head is small or large.
The comparison stops being exact because the grid sits on a curved, individual skull using specific measurement paths (front-to-back, side-to-side, and around the circumference), and the letters and numbers are a formal, internationally agreed code — not convenient labels. Getting a landmark or proportion wrong shifts every downstream position.
Simple Example
Two patients with very different head sizes both have a sleep study. Using the 10-20 system, C3 and C4 sit at the same proportional location on both, so their central EEG signals represent the same brain regions and can be scored and compared consistently.
Worked example
- Identify the four landmarks — nasion, inion, left/right preauricular points.
- Understand that anterior-posterior, transverse, and circumferential measurements define the grid.
- Recognize that sites fall at 10%/20% intervals, making placement reproducible across head sizes.
- Confirm the lab's modified 10-20 montage (typically F3, F4, C3, C4, O1, O2, M1, M2) and its derivation (referential vs. bipolar).
- Verify each channel shows the expected waveform for its region and reference — signal recognition, not interpretation.
- Document the montage, references, and any deviations so scoring and future studies are reproducible.
Hands-on placement is performed and competency-validated under supervision following institutional protocol, accreditation standards, and manufacturer IFU; this describes the conceptual system, not a step-by-step placement procedure.
Key takeaways
- High yield: The 10-20 system uses proportional (10%/20%) distances, not fixed measurements.
- High yield: The four landmarks are the nasion, inion, and left/right preauricular points.
- High yield: Cranial measurements are anterior-posterior, transverse, and circumferential.
- High yield: Odd = left, even = right, "z" = midline in labeling.
- High yield: The modified sleep montage commonly includes F3, F4, C3, C4, O1, O2, M1, M2.
- High yield: M1/M2 are current mastoid labels; A1/A2 are the older equivalents.
- High yield: Referential = against a common reference; bipolar = between two active electrodes.
- High yield: Standardized, documented placement makes recordings comparable.
Study tools & related lessonsYou’ll learn to · Key vocabulary · Related
You’ll learn to
- Define the International 10-20 system and identify its four skull landmarks.
- Explain the proportional-placement principle and standardized-placement rationale.
- Identify the electrodes of the modified 10-20 sleep montage and distinguish referential from bipolar derivation.
- Explain why documentation and awareness of institutional montage variation matter.
Key vocabulary
- International 10-20 system
- Proportional scalp-electrode placement standard
- Nasion
- Bridge-of-nose indentation
- Inion
- Back-of-skull prominence
- Preauricular points
- Depressions in front of each ear
- Cranial measurements
- Anterior-posterior, transverse, circumferential distances
- Proportional placement
- Sites at 10%/20% fractions of distances
- Modified 10-20 sleep montage
- Reduced electrode set for staging
- F3, F4
- Left/right frontal electrodes
- C3, C4
- Left/right central electrodes
- O1, O2
- Left/right occipital electrodes
- M1, M2
- Left/right mastoid references
- A1/A2 terminology
- Older left/right ear-reference labels
- Referential montage
- Electrode vs. common reference
- Bipolar montage
- Difference between two active electrodes
- Electrode labeling
- Region letter + side number/letter
- Standardized placement rationale
- Reproducible, comparable, region-aligned sites
- Documentation
- Recording montage, references, deviations
- Institutional montage variation
- Lab-specific montage differences
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